Extremely fine-pitch printing with a 10x Schwarzschild optic at extreme ultraviolet wavelengths

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 357-362

  Shumway, M D ^a   Sang Hun Lee, ^a   Chang Hyun Cho, ^a   Naulleau, P ^a   Goldberg, K A ^a   Bokor, J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

EUV; Extreme ultraviolet lithography; Imaging; Schwarzschild objective; Spatial frequency doubling

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; IMAGING TECHNIQUES; INTERFEROMETRY; OPTICAL SYSTEMS;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0034761507     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436690     Document Type: Conference Paper

References (9)

1. Extreme ultraviolet lithography
2. Ultralight lithography
3. A phase-shifting point diffraction interferometer
4. Sub-100-nm imaging with the EUV 10x Microstepper
5. Spatial frequency doubling lithography (SFDL) of periodic structures for integrated optical circuit technology
6. Integrated optical circuit grating fabrication using 0.25 mu m optical lithography
7. Direct comparison of EUV and visible-light interferometries
8. EUV interferometric measurements of diffraction-limited optics