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Volumn 99, Issue 4, 1996, Pages 273-284

Chemical, mechanical and electrical properties of CNx-films produced by reactive sputtering and N+-implantation in carbon films

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; ELASTICITY; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; FILM PREPARATION; GRAPHITE; HARDNESS; ION IMPLANTATION; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030212747     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00463-1     Document Type: Article
Times cited : (20)

References (41)
  • 30
    • 0020924170 scopus 로고
    • Eds. D. Briggs and M.P. Seah Wiley, New York
    • D. Briggs, in: Practical Surface Analysis, Eds. D. Briggs and M.P. Seah (Wiley, New York, 1983) pp. 359-396.
    • (1983) Practical Surface Analysis , pp. 359-396
    • Briggs, D.1
  • 31
    • 0020928843 scopus 로고
    • Eds. D. Briggs and M.P. Seah Wiley, New York
    • D. Briggs and J.C. Riviere, in: Practical Surface Analysis, Eds. D. Briggs and M.P. Seah (Wiley, New York, 1983) pp. 87-140.
    • (1983) Practical Surface Analysis , pp. 87-140
    • Briggs, D.1    Riviere, J.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.