Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 239-244

  Kohzaki, M ^a,b   Matsumuro, A ^a   Hayashi, T ^a   Muramatsu, M ^a   Yamaguchi, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b Rd Management Section   (Japan)

Author keywords

Carbon nitride thin films; Film hardness; Friction coefficient; Ion beam assisted deposition; Mechanical properties

Indexed keywords

CHEMICAL BONDS; CRYSTAL STRUCTURE; EVAPORATION; FILM PREPARATION; HARDNESS; ION BOMBARDMENT; SEMICONDUCTING SILICON; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

BONDING STATES; CARBON NITRIDE FILMS; DISORDERED TURBOSTRATIC STRUCTURE; ION BEAM ASSISTED DEPOSITION;

AMORPHOUS FILMS;

EID: 0346089952     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00420-3     Document Type: Article

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