Tribological study of CNx films prepared by reactive d.c. magnetron sputtering

Wear

Volumn 213, Issue 1-2, 1997, Pages 80-89

  Hajek, V ^a   Rusnak, K ^a   Vlcek, J ^a   Martinu, L ^b   Hawthorne, H M ^c  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Carbon nitride films; Friction; Magnetron sputtering; R.f. bias voltage; Sliding wear; Tribological properties

Indexed keywords

ALUMINA; AMORPHOUS FILMS; DELAMINATION; FRICTION; GRAPHITE; MAGNETRON SPUTTERING; NITRIDES; NITROGEN; PLASMAS; SEMICONDUCTING SILICON; THICK FILMS; WEAR OF MATERIALS;

CARBON NITRIDE FILM; DIAMOND LIKE CARBON FILM; FRICTION COEFFICIENT; SCRATCH TEST MEASUREMENT; SLIDING WEAR; WEAR RATE;

TRIBOLOGY;

EID: 0031362994     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0043-1648(97)00176-2     Document Type: Article

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