Preparation and characterization of indium tin oxide films formed by oxygen ion beam assisted deposition

Solid State Communications

Volumn 126, Issue 9, 2003, Pages 509-513

  Liu, C ^a,b   Mihara, T ^a   Matsutani, T ^a   Asanuma, T ^a   Kiuchi, M ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b WUHAN UNIVERSITY   (China)

Author keywords

A. Indium tin oxide; D. Ion beam assisted deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; EVAPORATION; HALL EFFECT; ION BEAM ASSISTED DEPOSITION; MORPHOLOGY; OPACITY; SURFACE ROUGHNESS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ION BEAM ENERGY;

INDIUM COMPOUNDS;

EID: 0038558350     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1098(03)00237-0     Document Type: Article

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