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Volumn 47, Issue 7 SPEC., 2003, Pages 1219-1225

Two-dimensional modeling of quantum ballistic transport in ultimate double-gate SOI devices

Author keywords

Ballistic transport; Double gate devices; Quantum tunnelling; Short channel effects; SOI

Indexed keywords

COMPUTER SIMULATION; ELECTRON TRANSPORT PROPERTIES; ELECTRON TUNNELING; POISSON EQUATION; QUANTUM THEORY;

EID: 0038417892     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(03)00039-X     Document Type: Conference Paper
Times cited : (77)

References (16)
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    • Chang, L.1    Hu, C.2
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    • Shrinking limits of silicon MOSFETs: Numerical study of 10 nm scale devices
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.