메뉴 건너뛰기




Volumn 21, Issue 5, 2000, Pages 242-244

Modeling of 10-nm-scale ballistic MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; COMPUTER SIMULATION; DATA STORAGE EQUIPMENT; ELECTRIC CURRENTS; ELECTRON TUNNELING; GATES (TRANSISTOR); LOGIC DEVICES; NUMERICAL METHODS; QUANTUM THEORY; SEMICONDUCTOR DEVICE MODELS; SILICON ON INSULATOR TECHNOLOGY; TRANSCONDUCTANCE;

EID: 0033747807     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.841309     Document Type: Article
Times cited : (120)

References (14)
  • 1
    • 0033115380 scopus 로고    scopus 로고
    • Nanoscale CMOS
    • Apr.
    • H.-S. P. Wong et al., "Nanoscale CMOS," Proc. IEEE, vol. 87, pp. 537-570, Apr. 1999.
    • (1999) Proc. IEEE , vol.87 , pp. 537-570
    • Wong, H.-S.P.1
  • 2
    • 85056911965 scopus 로고
    • Monte carlo simulation of a 30 nm dual-gate MOSFET: How short can si go?
    • D. J. Frank, S. E. Laux, and M. V. Fischetti, "Monte Carlo simulation of a 30 nm dual-gate MOSFET: How short can Si go?," IEDM Tech. Dig., pp. 553-556, 1992.
    • (1992) IEDM Tech. Dig , pp. 553-556
    • Frank, D.J.1    Laux, S.E.2    Fischetti, M.V.3
  • 3
    • 36449008742 scopus 로고
    • Ballistic metal-oxide-semiconductor field effect transistor
    • Oct.
    • K. Natori, "Ballistic metal-oxide-semiconductor field effect transistor," J. Appl. Phys., vol. 76, pp. 4879-4890, Oct. 1994.
    • (1994) J. Appl. Phys , vol.76 , pp. 4879-4890
    • Natori, K.1
  • 4
    • 0031191310 scopus 로고    scopus 로고
    • Elementary scattering theory of the si MOSFET
    • July
    • M. Lundstrom, "Elementary scattering theory of the Si MOSFET," IEEE Electron. Device Lett., vol. 18, pp. 361-363, July 1997.
    • (1997) IEEE Electron. Device Lett , vol.18 , pp. 361-363
    • Lundstrom, M.1
  • 5
    • 0033882240 scopus 로고    scopus 로고
    • On the performance limits for si MOSFET's: A theoretical study
    • Jan., to be published.
    • F. Assad, Z. Ren, D. Vasileska, S. Datta, and M. Lundstrom, "On the performance limits for Si MOSFET's: A theoretical study," IEEE Trans. Electron Devices, vol. 47, pp. 232-240, Jan. 2000, to be published.
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 232-240
    • Assad, F.1    Z, R.2    Vasileska, D.3    Datta, S.4    Lundstrom, M.5
  • 6
    • 0000265087 scopus 로고    scopus 로고
    • Nanoscale field-effect transistors: An ultimate size analysis
    • Dec.
    • F. G. Pikus and K. K. Likharev, "Nanoscale field-effect transistors: An ultimate size analysis," Appl. Phys. Lett., vol. 71, pp. 3661-3663, Dec. 1997.
    • (1997) Appl. Phys. Lett , vol.71 , pp. 3661-3663
    • Pikus, F.G.1    Likharev, K.K.2
  • 7
    • 0343509014 scopus 로고    scopus 로고
    • P. M. Solomon, "On contacts to small semiconductor devices," unpublished.
    • P. M. Solomon, "On contacts to small semiconductor devices," unpublished.
  • 8
    • 0032072525 scopus 로고    scopus 로고
    • Monte carlo simulation of electron transport properties in extremely thin SOI MOSFET's
    • May
    • F. Gamiz et al., "Monte Carlo simulation of electron transport properties in extremely thin SOI MOSFET's," IEEE Trans. Electron Devices, vol. 45, pp. 1122-1125, May 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 1122-1125
    • Gamiz, F.1
  • 9
    • 0042027083 scopus 로고    scopus 로고
    • A metal/insulator tunnel transistor with 16 nm channel length
    • May
    • R. Sasajima, K. Fujimaru, and H. Matsumura, "A metal/insulator tunnel transistor with 16 nm channel length," Appl. Phys. Lett., vol. 74, pp. 3215-3217, May 1999.
    • (1999) Appl. Phys. Lett. , vol.74 , pp. 3215-3217
    • Sasajima, R.1    Fujimaru, K.2    Matsumura, H.3
  • 10
  • 11
    • 0032284102 scopus 로고    scopus 로고
    • Device design considerations for double-gate, ground-plane, and single-gated ultra-thin MOSFET's at the 25 nm channel length generation
    • H.-S. Wong, D. J. Frank, and P. M. Solomon, "Device design considerations for double-gate, ground-plane, and single-gated ultra-thin MOSFET's at the 25 nm channel length generation," IEDM Tech. Dig., pp. 407-410, 1998.
    • (1998) IEDM Tech. Dig. , pp. 407-410
    • Wong, H.-S.1    Frank, D.J.2    Solomon, P.M.3
  • 12
    • 0033116184 scopus 로고    scopus 로고
    • Single-electron devices and their applications
    • Apr.
    • K. Likharev, "Single-electron devices and their applications," Proc. IEEE, vol. 87, pp. 606-632, Apr. 1999.
    • (1999) Proc. IEEE , vol.87 , pp. 606-632
    • Likharev, K.1
  • 14
    • 0033365578 scopus 로고    scopus 로고
    • A 60 nm channel length silicon stacked tunnel transistor
    • K. Nakazato, K. Itoh, H. Mizuta, and H. Ahmed, "A 60 nm channel length silicon stacked tunnel transistor," in DRC Dig., 1999, pp. 132-133.
    • (1999) DRC Dig. , pp. 132-133
    • Nakazato, K.1    Itoh, K.2    Mizuta, H.3    Ahmed, H.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.