Elimination of resist poisoning in via-first dual damascene processes

Journal of Photopolymer Science and Technology

Volumn 16, Issue 3, 2003, Pages 351-361

  Nagahara, Seiji ^a   Fujimoto, Masashi ^a   Yamana, Mitsuharu ^a   Watanabe, Susumu ^a   Shiba, Kazutoshi ^a   Tominaga, Makoto ^a  

^a RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

Amine; Nonaqueous titration; Quencher; Resist poisoning; Via first dual damascene

Indexed keywords

AMINE; BUFFER;

ADSORPTION; ARTICLE; ATMOSPHERIC PRESSURE; CAPILLARY ELECTROPHORESIS; DESORPTION; HIGH TEMPERATURE; ION PAIR CHROMATOGRAPHY; IONIZATION; MASS SPECTROMETRY; PH; PROCESS TECHNOLOGY;

EID: 0038168327     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.351     Document Type: Article

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