Polymeric base additives for lithographic improvement in DUV resist system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1040-1051

  Huang, Wu Song ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACETAL RESINS; AMINES; CARBOXYLATION; POLYMER BLENDS; SALTS; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; POST EXPOSURE BAKE (PEB) SENSITIVITY;

PHOTORESISTS;

EID: 0032633842     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350154     Document Type: Conference Paper

References (30)