Development of full-fill bottom anti-reflective coatings for dual damascene process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue 1, 2001, Pages 838-845

  Wang, Yubao ^a   Wu, Xiaoming ^a   Xu, Gu ^a   Lamb, Jim ^a   Sullivan, John ^a   Claypool, James ^a   Backus, Jackie ^a   Trautman, Sean ^a   Shao, Xie ^a   Takei, Satoshi ^b   Sone, Yasuhisa ^b   Mizusawa, Kenichi ^b   Fukuro, Hiroyoshi ^b  

^a BREWER SCIENCE INC   (United States)

^b NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

Author keywords

Bottom Anti reflective Coating (BARC); Dual damascene; Etch block; Planarizing BARC; Via Fill; Via first

Indexed keywords

ASPECT RATIO; ETCHING; LIGHT REFLECTION; PERMITTIVITY; PHOTORESISTS; THIN FILMS;

DUAL DAMASCENE; ETCH BLOCKS;

ANTIREFLECTION COATINGS;

EID: 0038352554     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436917     Document Type: Article

References (7)