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Volumn 4691, Issue 1, 2002, Pages 1-10

High NA lithographic imagery at Brewster's angle

Author keywords

High NA imagery; High NA optics; High resolution lithography; Holographic lithography; Interferometric lithography; Lithography; Microlithography; Polarization; Swing curve

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; HOLOGRAPHY; IMAGING TECHNIQUES; INTERFEROMETRY; LIGHT POLARIZATION; REFRACTIVE INDEX;

EID: 0036416070     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474473     Document Type: Article
Times cited : (40)

References (14)
  • 1
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  • 2
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    • Imaging in high-aperture optical systems
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    • Sheppard, C.1    Matthews, H.2
  • 3
    • 84994893976 scopus 로고    scopus 로고
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    • PROLITH/2™, a product of KLA-Tencor Corp.
  • 4
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    • (1991) SPIE , vol.1466 , pp. 297
    • Brunner, T.1
  • 5
    • 0035758715 scopus 로고    scopus 로고
    • High NA swing curve effects
    • T. Brunner, A. Gabor, C. Wu, N. Chen, "High NA swing curve effects", SPIE 4346, pp. 1050-1057 (2001).
    • (2001) SPIE , vol.4346 , pp. 1050-1057
    • Brunner, T.1    Gabor, A.2    Wu, C.3    Chen, N.4
  • 6
    • 0005451266 scopus 로고    scopus 로고
    • Tunable ARCs with built-in hard mask properties facilitating thin resist processing
    • A.P. Mahorowala, K. Babich, K. Petrillo et al., "Tunable ARCs with built-in hard mask properties facilitating thin resist processing", SPIE 4343, pp. 305-316 (2001).
    • (2001) SPIE , vol.4343 , pp. 305-316
    • Mahorowala, A.P.1    Babich, K.2    Petrillo, K.3
  • 9
    • 0024664234 scopus 로고
    • Optical projection lithography using lenses with NA greater than 1
    • H. Kawata, J. Carter, A. Yen and H. Smith, "Optical projection lithography using lenses with NA greater than 1", Microelectronic Engin. 9, pp. 31-36 (1989).
    • (1989) Microelectronic Engin. , vol.9 , pp. 31-36
    • Kawata, H.1    Carter, J.2    Yen, A.3    Smith, H.4
  • 13
    • 0000293405 scopus 로고
    • Experimental verification of high NA effects in photoresist
    • D.G. Flagello and T.D. Milster, "Experimental verification of high NA effects in photoresist", SPIE 2197, pp. 466-477 (1994).
    • (1994) SPIE , vol.2197 , pp. 466-477
    • Flagello, D.G.1    Milster, T.D.2
  • 14
    • 0011232045 scopus 로고
    • Optical lithography as the NA=1 limit approaches
    • Optical Society of America, Washington, D.C., 1992
    • A.E. Rosenbluth, T.A. Brunner, D.G. Flagello, "Optical lithography as the NA=1 limit approaches," in OSA Annual Meeting Technical Digest 1992 (Optical Society of America, Washington, D.C., 1992), Vol. 23, p.46.
    • (1992) OSA Annual Meeting Technical Digest , vol.23 , pp. 46
    • Rosenbluth, A.E.1    Brunner, T.A.2    Flagello, D.G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.