Resolution enhancement of 157 nm lithography by liquid immersion

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 459-465

  Switkes, M ^a   Rothschild, M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

157 nm; Immersion lithography; Interference lithography; Optical lithography; Perfluoropolyether

Indexed keywords

FLUORINE CONTAINING POLYMERS; LENSES; LIGHT INTERFERENCE; LIGHT REFRACTION; POLYETHERS; PROJECTION SYSTEMS;

LIQUID IMMERSION LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0036415116     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474568     Document Type: Conference Paper

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