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Volumn 67-68, Issue , 2003, Pages 283-291
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Resist process issues related to the glass transition changes in chemically amplified resist films
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Author keywords
Glass transition temperature; Lithography; Optical interferometry; Polymers; Resists; Thin films
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Indexed keywords
DIFFERENTIAL SCANNING CALORIMETRY;
GLASS TRANSITION;
INTERFEROMETRY;
LITHOGRAPHY;
POLYMERS;
SPIN COATING;
CHEMICALLY AMPLIFIED RESIST (CAR);
THIN FILMS;
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EID: 0037683096
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(03)00080-7 Document Type: Conference Paper |
Times cited : (8)
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References (22)
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