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Volumn 67-68, Issue , 2003, Pages 283-291

Resist process issues related to the glass transition changes in chemically amplified resist films

Author keywords

Glass transition temperature; Lithography; Optical interferometry; Polymers; Resists; Thin films

Indexed keywords

DIFFERENTIAL SCANNING CALORIMETRY; GLASS TRANSITION; INTERFEROMETRY; LITHOGRAPHY; POLYMERS; SPIN COATING;

EID: 0037683096     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00080-7     Document Type: Conference Paper
Times cited : (8)

References (22)
  • 1
    • 0037753860 scopus 로고    scopus 로고
    • http://public.itrs.net/Files/2001ITRS/Litho.pdf.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.