Study of acid diffusion in resist near the glass transition temperature

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3351-3355

  Fryer, David S ^a   Bollepali, Srinivas ^a   De Pablo, Juan J ^a   Nealey, Paul F ^a  

^a Wisconsin Electric Machines and Power Electronics Consortium   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033260109     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591010     Document Type: Article

References (22)

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