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Volumn 57-58, Issue , 2001, Pages 525-530
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Free volume effect on resist lithographic performance
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Author keywords
Electron beam lithography; Lithographic performance; PAB; Post apply bake
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Indexed keywords
ELECTRON BEAMS;
INTERFEROMETERS;
LITHOGRAPHY;
OPTIMIZATION;
ORGANIC SOLVENTS;
SURFACE ROUGHNESS;
CHEMICALLY AMPLIFIED RESISTS (CAR);
MICROELECTRONICS;
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EID: 0035450831
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(01)00544-5 Document Type: Conference Paper |
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Times cited : (3)
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References (8)
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