Thermal analysis of photoresists in aid of lithographic process development

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 141-144

  Tegou, E ^a   Gogolides, E ^a   Hatzakis, M ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; DIFFERENTIAL SCANNING CALORIMETRY; FILMS; GLASS TRANSITION; TEMPERATURE; THERMOANALYSIS;

DEEP ULTRA VIOLET; THERMOMECHANICAL ANALYSIS;

PHOTORESISTS;

EID: 0031072491     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00174-8     Document Type: Article

References (4)

1. E. Gogolides, E. Tegou, K. Beltsios, K. Papadokostaki, M. Hatzakis, Microelec. Eng. 30, 267 (1996).
2. P. Paniez and L. Pain, J. Photopol. Sci. Technol. 8(4), 643 (1995).
3. E. Gogolides, D. Tzevelekis, S. Grigoropoulos, E. Tegou, and M. Hatzakis, J. Vac. Sci. Technol. B 14(5), Sep/Oct 1996.
4. P. Argitis, I. Raptis, C.S. Aidinis, N. Glezos, M. Baciocchi, J. Everett, M. Hatzakis, J. Vac. Sci. Technol. B 14, 3030 (1995).