High resolution electron beam lithography studies on Shipley chemically amplified DUV resists

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 213-216

  Macintyre, D ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COPOLYMERS; PHOTORESISTS; SEMICONDUCTING POLYMERS;

CHEMICALLY AMPLIFIED RESIST; DEEP ULTRAVIOLET; HIGH RESOLUTION ELECTRON BEAM LITHOGRAPHY; ISOLATED LINE; NEGATIVE RESIST; PHOTOACID GENERATOR; POST EXPOSURE BAKE;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031072581     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00083-4     Document Type: Article

References (2)

1. D.P. Mancini, D. J. Resnick, K. J. Nordquist, W. J. Dauksher and M. A. McCord, SPIE Proceedings, 2723, [1996], 112
2. D.S. Macintyre and S. Thoms, Microelectronic Engineering 30, (1996), 327-330