Hydrogen incorporation in CNx films deposited by ECR chemical vapor deposition

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 632-635

  Camero, M ^a   Gago, R ^b   Gomez Aleixandre C ^a   Albella, J M ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Amorphous hydrogenated carbon; Carbon nitride; Impurity characterisation; Plasma CVD

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; GASES; HYDROGEN; INFRARED SPECTROSCOPY; MIXTURES;

ELASTIC RECOIL DETECTION ANALYSIS (ERDA);

AMORPHOUS FILMS;

DIAMOND;

EID: 0037515325     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00400-4     Document Type: Article

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