Growth of microcrystalline β-SiC films on silicon by ECR plasma CVD

Applied Surface Science

Volumn 138-139, Issue 1-4, 1999, Pages 424-428

  Toal, S J ^a   Reehal, H S ^a   Barradas, N P ^b   Jeynes, C ^b  

^a LONDON SOUTH BANK UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

ECR CVD; Microcrystalline silicon carbide; Rutherford backscattering; Simulated annealing; Solar cells

Indexed keywords

EID: 0347182000     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00435-8     Document Type: Article

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