Indentation creep of nitrogen-containing carbon films

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 11 PART A, 1996, Pages

  Tanaka, Daisuke ^a   Ohshio, Shigeo ^a   Nishino, Jun Ichi ^a   Saitoh, Hidetoshi ^a  

^a NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Amorphous; ECR plasma CVD; Hardness; Indentation creep; Nitrogen containing carbon film; Viscoelasticity

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CREEP TESTING; ELECTRON CYCLOTRON RESONANCE; HARDNESS; PLASMA APPLICATIONS; STRAIN RATE; THERMAL EFFECTS; VISCOELASTICITY;

INDENTATION CREEP TEST; NITROGEN CONTAINING CARBON FILMS; TIME DEPENDENT INDENTATION;

AMORPHOUS FILMS;

EID: 0030286844     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l1452     Document Type: Article

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