Amorphous CNx layers from neon electron cyclotron resonance plasmas with N2 and CH4 as precursors

Journal of the Electrochemical Society

Volumn 147, Issue 10, 2000, Pages 3864-3867

  Barbadillo, L ^a   Hernandez M J ^a   Cervera, M ^a   Piqueras, J ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; METHANE; NEON; NITROGEN; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON;

NEON ELECTRON CYCLOTRON RESONANCE PLASMAS; OPTICAL EMISSION SPECTROSCOPY; PRECURSORS;

THIN FILMS;

EID: 0034294572     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393987     Document Type: Article

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