Carbon nitride films produced using electron cyclotron resonance nitrogen plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4897-4900

  Zhang, Mei ^a   Pan, Lujun ^a   Miyazaki, Tsutomu ^a   Nakayama, Yoshikazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Amorphous; Carbon nitride; ECR plasma; Film deposition; Plasma CVD

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRON CYCLOTRON RESONANCE; EMISSION SPECTROSCOPY; FILM GROWTH; LIGHT EMISSION; NITRIDES; PLASMA APPLICATIONS; SUBSTRATES; THERMAL EFFECTS;

CARBON NITRIDE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

AMORPHOUS FILMS;

EID: 0031176033     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4897     Document Type: Article

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