Buried interfaces studied by photoelectron diffraction

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 5, 2003, Pages 721-730

  Westphal, C ^a  

^a TU DORTMUND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON DIFFRACTION; ELECTRON EMISSION; MONTE CARLO METHODS; PHASE TRANSITIONS; SEMICONDUCTING SILICON; SILICA; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

BURIED INTERFACES; PHOTOELECTRON DIFFRACTION; PHOTOELECTRON INTENSITY; SURFACE ORIENTATION;

INTERFACES (MATERIALS);

EID: 0037355957     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-2011-6     Document Type: Article

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