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Volumn 42, Issue SUPPL.2, 2003, Pages

The effects of oxygen post-plasma treatment on the bonding structure and dielectric properties of a-C:F films deposited by ICPCVD

Author keywords

a C:F film; Dielectric Constant; ICPCVD; Low k Material

Indexed keywords


EID: 0037310689     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.