Characterization of highly hydrophobic coatings deposited onto pre-oxidized silicon from water dispersible organosilanes

Thin Solid Films

Volumn 423, Issue 1, 2003, Pages 77-87

  Almanza Workman, A Marcia ^a   Raghavan, Srini ^a   Petrovic, Slobodan ^b   Gogoi, Bishnu ^b   Deymier, Pierre ^a   Monk, David J ^b   Roop, Ray ^b  

^a University of Arizona   (United States)

^b MOTOROLA INC   (United States)

Author keywords

Coating defects; Electrochemical impedance spectroscopy; Hydrophobic coatings; Stiction; Water dispersible organosilanes

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; CHARGE TRANSFER; CONTACT ANGLE; ELLIPSOMETRY; HYDROPHOBICITY; INTERFACES (MATERIALS); MICROELECTROMECHANICAL DEVICES; OXIDATION; POLYMERIZATION; PROTEINS; SILANES; SINGLE CRYSTALS;

HYDROPHOBIC COATINGS;

COATING TECHNIQUES;

EID: 0037217658     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00997-5     Document Type: Article

References (43)

1. Maboudian R., Ashurst W.R., Carraro C. Sensors Actuators. 82:2000;219.
2. Srinivasan U., Houston M.R., Howe R.T., Maboudian R. J. Microelectromech. Syst. 7:1998;252.
3. M.R. Houston, R. Maboudian, R.T. Howe, Solid State Sensor and Actuator Workshop, Hilton Head, SC, June 2-6 (1996) 42.
4. Ulman A. Chem. Rev. 96:1996;1533.
5. Legrange J.D., Markham J.L., Kurkjian C.R. Langmuir. 9:1993;1749.
6. Tripp C.P., Hair M.L. Langmuir. 8:1992;1120.
7. Angst D.L., Simmons G.W. Langmuir. 7:1991;2236.
8. Brandriss S., Margel S. Langmuir. 9:1993;1232.
9. Parikh A.N., Allara D.L., Azouz I.B., Rondelez F. J. Phys. Chem. 98:1994;7577.
10. Kojio K., Takahara A., Kajiyama T. Colloids Surf. A. 169:2000;295.
11. Vallant T., Kattner J., Brunner H., Mayer U., Hoffmann H. Langmuir. 15:1999;5339.
12. Hoffmann H., Mayer U., Krischanitz A. Langmuir. 11:1995;1304.
13. Allara D.L., Parikh A.N., Rondelez F. Langmuir. 11:1995;2357.
14. Finklea H.O., Robinson L.R., Blackburn A., Richter B., Allara D., Bright T. Langmuir. 2:1986;239.
15. Sagiv J. J. Am. Chem. Soc. 102:1980;92.
16. Semal S., Voue M., De Ruijter M.J., Dehuit J., De Coninck J. J. Phys. Chem. B. 103:1999;4854.
17. Vallant T., Brunner H., Mayer U., Hoffmann H., Leitner T., Resch R., Friedbacher G. J. Phys. Chem. B. 102:1998;7190.
18. Sheller N.B., Petrash S., Foster M.D., Tsukruk V.V. Langmuir. 14:1998;4535.
19. Carraro C., Yauw O.W., Sung M.M., Maboudian R. J. Phys. Chem. B. 102:1998;4441.
20. Gauthier S., Aime J.P., Bouhacina T., Attias A.J., Desbat B. Langmuir. 12:1996;5126.
21. Ge S.R., Takahara A., Kajiyama T. Langmuir. 11:1995;1341.
22. Rye R.R. Langmuir. 13:1997;2588.
23. Brzoska J.B., Shahidzadeh N., Rondelez F. Nature. 360:1992;719.
24. Pope E.J.A., Mackenzie J.D. J. Non-cryst. Solids. 87:1986;185.
25. Ashurst W.R., Yau C., Carraro C., Maboudian R., Dugger M.T. J. Microelectromech. Syst. 10:2001;41.
26. Protsailo L.V., Fawcett W.R. Electrochim. Acta. 45:2000;3497.
27. Diao P., Jiang D.L., Cui X.L., Gu D.P., Tong R.T., Zhong B. J. Electroanal. Chem. 464:1999;61.
28. Finklea H.O., Avery S., Lynch M., Furtsch T. Langmuir. 3:1987;409.
29. Boulas C., Davidovits J.V., Rondelez F., Vuillaume D. Phys. Rev. Lett. 76:1996;4797.
30. Bertagna V., Erre R., Rouelle F., Chemla M. J. Solid State Electrochem. 4:1999;42.
31. Bertagna V., Plougonven C., Rouelle F., Chemla M. J. Electroanal. Chem. 422:1997;115.
32. Almanza-Workman A.M., Raghavan S., Deymier P., Monk D.J., Roop R. J. Electrochem. Soc. 149:2002;H6.
33. A.M. Almanza-Workman, S. Raghavan, P. Deymier, D.J. Monk, R. Roop, Proceedings of the 198th Electrochemical Society Meeting 2000-19 (2000) 235.
34. A.M. Almanza-Workman, S. Raghavan, P. Deymier, D.J. Monk, R. Roop, Diffus. Defect Data, Pt. B, Oostende, Belgium, Proceedings of the 5th International Symposium on Ultra Clean Processing of Silicon Surfaces 2000 76/77 (2001) 23.
35. Kahn F.J. Appl. Phys. Lett. 22:1973;386.
36. Fadeev A.Y., McCarthy T.J. Langmuir. 16:2000;7268.
37. Israelachvili J.N., Gee M.L. Langmuir. 5:1989;288.
38. Cheng X., Li G., Kneer E.A., Vermeire B., Parks H.G., Raghavan S., Jeon J.S. J. Electrochem. Soc. 145:1998;352.
39. Chazalviel J.N. Electrochim. Acta. 35:1990;1545.
40. Scully J.R., Frankenthal R.P., Hanson K.J., Siconolfi D.J., Sinclair J.D. J. Electrochem. Soc. 137:1990;1365.
41. Macdonald J.R. Impedance Spectroscopy: Emphasizing Solid Materials and Systems. 1987;Wiley, New York.
42. Jennings G.K., Munro J.C., Yong T.H., Laibinis P.E. Langmuir. 14:1998;6130.
43. Saakes M., van Duin P.J., Ligtvoet A.C.P., Schmal D. J. Power Sources. 47:1994;149.