Ionic components dependence of the charge transfer reactions at the silicon/HF solution interface

Journal of Solid State Electrochemistry

Volumn 4, Issue 1, 1999, Pages 42-51

  Bertagna, Valérie ^a   Erre, Rene ^a   Rouelle, François ^b   Chemla, Marius ^b  

^a UNIVERSITÉ D'ORLÉANS   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

Fluoride ions; Hydrofluoric acid; Passivation; Silicon

Indexed keywords

EID: 0001900182     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s100080050190     Document Type: Article

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