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Volumn 409, Issue 2, 2002, Pages 178-184

The effect of pressure control on a thermally stable a-C:N thin film with low dielectric constant by electron cyclotron resonance-plasma

Author keywords

Amorphous materials; Carbon; Dielectric properties; X Ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CARBON NITRIDE; CHEMICAL BONDS; COMPOSITION; CROSSLINKING; ELECTRON CYCLOTRON RESONANCE; ELECTRONIC PROPERTIES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0037197368     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00146-3     Document Type: Article
Times cited : (11)

References (36)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.