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Volumn 409, Issue 2, 2002, Pages 178-184
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The effect of pressure control on a thermally stable a-C:N thin film with low dielectric constant by electron cyclotron resonance-plasma
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Author keywords
Amorphous materials; Carbon; Dielectric properties; X Ray photoelectron spectroscopy
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Indexed keywords
AMORPHOUS FILMS;
ATOMIC FORCE MICROSCOPY;
CARBON NITRIDE;
CHEMICAL BONDS;
COMPOSITION;
CROSSLINKING;
ELECTRON CYCLOTRON RESONANCE;
ELECTRONIC PROPERTIES;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
PERMITTIVITY;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SILICON;
SUBSTRATES;
THERMODYNAMIC STABILITY;
X RAY PHOTOELECTRON SPECTROSCOPY;
FIELD EMISSION-SCANNING ELECTRON MICROSCOPY (FE-SEM);
THIN FILMS;
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EID: 0037197368
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(02)00146-3 Document Type: Article |
Times cited : (11)
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References (36)
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