Internal stress of amorphous carbon nitride films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 3, 2000, Pages 1773-1775

  Aono, Masami ^a   Nitta, Shoji ^a   Katsuno, Takashi ^a   Iuchi, Takeshi ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; NITRIDES; PERMITTIVITY; RESIDUAL STRESSES; SUBSTRATES; ULTRATHIN FILMS;

AMORPHOUS CARBON NITRIDE FILMS; REACTIVE RADIOFREQUENCY MAGNETRON SPUTTERING; STONEY EQUATION;

AMORPHOUS FILMS;

EID: 0034187085     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591470     Document Type: Article

References (18)

1. N. Takada, K. Arai, S. Nitta, and S. Nonomura, Appl. Surf. Sci. 113/114, 274 (1997).
2. S. Nitta, N. Takada, K. Sugiyama, T. Itoh, and S. Nonomura, J. Non-Cryst. Solids 227-230, 655 (1998).
3. A. Y. Liu and M. L. Cohen, Science 245, 841 (1989).
4. M. Aono, S. Nitta, T. Iwasaki, H. Yokoi, T. Itoh, and S. Nonomura, Mater. Res. Soc. Symp. Proc. 565, 291 (1999).
5. M. Aono, S. Nitta, T. Katsuno, T. Itoh, and S. Nonomura, Appl. Surf. Sci. (in press).
6. Low Dielectric Constant Materials IV, edited by C. Chiang, P. S. Ho, Toh-Ming Lu, and J. T. Wetzel (Material Research Society, Warrendale, PA, 1998), Vol. 511.
7. S. Wolf, Silicon Processing for the VLSI Era (Lattice Press, Sunset Beach, CA, 1995), Vol. 3.
8. R. D. Miller, Science 286, 422 (1999).
9. T. Iwasaki, M. Aono, S. Nitta, H. Habuchi, T. Itoh, and S. Nonomura, Diamond Relat. Mater. 8, 440 (1999).
10. T. Iwasaki, M.A. thesis, School of Engineering, Gifu University, 1999.
11. J. T. Gotoh, S. Nonomura, M. Nishio, S. Nitta, M. Kondo, and A. Matsuda, Appl. Phys. Lett. 72, 2978 (1998).
12. G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).
13. A. Brenner and S. Senderoff, J. Res. Natl. Bur. Stand. 42, 105 (1949).
14. J. D. Finegan and R. W. Hoffman, AEC Tech. Rep. No. 15, Case Inst. Technol., Cleveland, 1961.
15. J. C. Phillips, J. Non-Cryst. Solids 34, 153 (1979).
16. H. Fritzsche, in Fundamental Physics of Amorphous Semiconductors, edited by F. Yonezawa, Springer Series in Solid State Sciences, Vol. 26 (Springer, Berlin, 1981), p. 3.
17. M. Aono, T. Katsuno, S. Nitta, T. Itoh, and S. Nonomura, Abstracts of MRS 1999 Fall Meeting (Boston, 1999), U. 6.3, p. 342.
18. R. W. Hoffman, in Physics of Thin Films, edited by G. Hass and R. E. Thun (Academic, New York, 1966), Vol. 3, p. 211.