Different pulse techniques for stationary reactive sputtering with double ring magnetron

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 723-727

  Bartzsch, H ^a   Frach, P ^a   Goedicke, K ^a   Gottfried, Chr ^a  

^a FRAUNHOFER INSTITUTE FOR MANUFACTURING TECHNOLOGY AND ADVANCED MATERIALS IFAM   (Germany)

Author keywords

Double Ring Magnetron; Gradient layer; Magnetron sputter source; Pulse sputtering; Reactive sputtering

Indexed keywords

COATING; PULSED FLOW; SPUTTERING;

EID: 0033512263     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00365-5     Document Type: Conference Paper

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