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Volumn 35, Issue 10, 2002, Pages 1032-1038
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X-ray-photoemission-spectroscopy evidence for anomalous oxidation states of silicon after exposure of hydrogen-terminated single-crystalline (100) silicon to a diluted N2: N2O atmosphere
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Author keywords
[No Author keywords available]
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Indexed keywords
NITROGEN;
OXIDATION;
SINGLE CRYSTALS;
THRESHOLD VOLTAGE;
X RAY PHOTOELECTRON SPECTROSCOPY;
TUNNEL CURRENTS;
SILICON;
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EID: 0037150310
PISSN: 00223727
EISSN: None
Source Type: Journal
DOI: 10.1088/0022-3727/35/10/311 Document Type: Article |
Times cited : (19)
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References (27)
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