The effect of native oxide on thin gate oxide integrity

IEEE Electron Device Letters

Volumn 19, Issue 11, 1998, Pages 426-428

  Chin, Albert ^a,b   Lin, B C ^b   Chen, W J ^c   Lin, Y B ^d   Tsai, C ^b  

^a IEEE   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^d CHUNG HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); LEAKAGE CURRENTS; OXIDES; THIN FILMS;

NATIVE OXIDE EFFECTS; THIN GATE OXIDE INTEGRITY;

GATES (TRANSISTOR);

EID: 0032204148     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.728901     Document Type: Article

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