Morphological and phase stability of nickel-germanosilicide on Si1-xGex under thermal stress

Journal of Applied Physics

Volumn 92, Issue 12, 2002, Pages 7193-7199

  Jarmar, Tobias ^a   Seger, J ^b   Ericson, F ^a   Mangelinck, D ^c   Smith, U ^a,d   Zhang, S L ^d  

^a UPPSALA UNIVERSITY   (Sweden)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c AIX MARSEILLE UNIVERSITÉ   (France)

^d ERICSSON RESEARCH   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; PHASE DIAGRAMS; POLYCRYSTALS; SILICON COMPOUNDS; THERMAL STRESS; TRANSMISSION ELECTRON MICROSCOPY;

SOLID-STATE INTERACTIONS;

NICKEL COMPOUNDS;

EID: 0037115705     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1522491     Document Type: Article

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