Salicides: Materials, scaling and manufacturability issues for future integrated circuits

Microelectronic Engineering

Volumn 50, Issue 1-4, 2000, Pages 87-101

  Kittl, J A ^a   Shiau, W T ^a   Hong, Q Z ^a   Miles, D ^a  

^a TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; COBALT COMPOUNDS; ELECTRIC RESISTANCE; INTEGRATED CIRCUIT MANUFACTURE; PHASE TRANSITIONS; SEMICONDUCTOR DEVICE STRUCTURES; TITANIUM COMPOUNDS;

COBALT DISALICIDES; SHEET RESISTANCE; TITANIUM DISALICIDES;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0033639561     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00269-5     Document Type: Article

References (18)

1. Maex K. Mater. Sci. Eng. R11:1993;53.
2. Kittl J.A., Hong Q.Z. Thin Solid Films. 320:1998;110.
3. Kittl J.A., Hong Q.Z., Yang H., Yu N., Samavedam S.B., Gribelyuk M.A. Thin Solid Films. 332:1998;404.
4. Lasky J.B., Nakos J.S., Cain O.J., Geiss P.J. IEEE Trans. Electron Devices. ED-38:1991;262.
5. Kittl J.A., Prinslow D.A., Apte P.P., Pas M.F. Appl. Phys. Lett. 67:1995;2308.
6. Yamazaki T., Goto K., Fukano T., Nara Y., Sugii T., Ito T. IEDM Tech. Digest. 1993:1993;906.
7. Kittl J.A., Hong Q.Z., Chao C.P., Chen I.C., Yu N., O'Brien S., Hanratty M. VLSI Tech. Digest. 1997:1997;103.
8. Hong Q.Z., Shiau W.T., Yang H., Kittl J.A., Chao C.P., Tsai H.L., Krishnan S., Chen I.C., Havemann R.H. IEDM Tech. Digest. 1997:1997;107.
9. Wang Q.F., Maex K., Kubicek S., Jonckheere R., Kerkwijk B., Verbeeck R., Biesemans S., De Meyer K. VLSI Tech. Digest. 1995:1995;17.
10. Goto K., Fushida A., Watanabe J., Sukegawa T., Kawamura K., Yamazaki T., Sugii T. IEDM Tech. Digest. 1995:1995;449.
11. Kittl J.A., Hong Q.Z., Rodder M., Prinslow D.A., Misium G. VLSI Tech. Digest. 1996:1996;14.
12. Kittl J.A., Hong Q.Z., Rodder M., Breedijk T. IEDM Tech. Digest. 1997:1997;111.
13. Wang Q.F., Lauwers A., Jonckx F., de Potter M., Chen C.-C., Maex K. Mater. Res. Soc. Symp. Proc. 402:1996;221.
14. Mann R.W., Miles G.L., Knotts T.A., Rakowski D.W., Clevenger L.A., Harper J.M.E., D'Heurle F.M., Cabral C. Jr. Appl. Phys. Lett. 67:1995;3729.
15. Mouroux A., Zhang S.L., Kaplan W., Nygren S., Ostling M., Petersson C.S. Appl. Phys. Lett. 69:1996;975.
16. Kittl J.A., Samavedam S.B., Gribelyuk M.A. Appl. Phys. Lett. 73:1998;900.
17. Iinuma T., Akutsu H., Ohuchi K., Miyashita K., Toyoshima Y., Suguro K. VLSI Tech. Digest. 1998:1998;188.
18. Inoue K., Mikagi K., Abiko H., Kikkawa T. IEDM Tech. Digest. 1995:1995;445.