Increased nucleation temperature of NiSi2 in the reaction of Ni thin films with Si1-xGex

Applied Physics Letters

Volumn 81, Issue 11, 2002, Pages 1978-1980

  Seger, J ^a   Zhang, S L ^a   Mangelinck, D ^b   Radamson, H H ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHIC STRUCTURE; ENTROPY OF MIXING; GE CONTENT; NI THIN FILMS; NUCLEATION TEMPERATURE; ORTHORHOMBIC STRUCTURES; SOLID-STATE INTERACTIONS; SPECIFIC RESISTIVITIES;

DROPS; NICKEL COMPOUNDS; NUCLEATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SOLID SOLUTIONS;

GERMANIUM;

EID: 79956034543     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1498868     Document Type: Article

References (21)

1. F. M. d'Heurle, J. Mater. Res. 3, 167 (1988). jmr JMREEE 0884-2914
2. S. Nygren, D. Caffin, M. Östling, and F. M. d'Heurle, Appl. Surf. Sci. 53, 87 (1991). asu ASUSEE 0169-4332
3. D. Mangelinck, P. Gas, J. M. Gay, B. Pichaud, and O. Thomas, J. Appl. Phys. 84, 2583 (1998). jap JAPIAU 0021-8979
4. P. S. Lee, K. L. Pey, D. Mangelinck, J. Ding, T. Osipowicz, and A. See, Electrochem. Solid-State Lett. 5, G15 (2002). 8sw ESLEF6 1099-0062
5. P.-E. Hellberg, S.-L. Zhang, and C. S. Petersson, IEEE Electron Device Lett. EDL-18, 456 (1997). edl EDLEDZ 0741-3106
6. S. Gannavaram, N. Pesovic, and M. C. Öztürk, Tech. Dig.-Int. Electron Devices Meet. 2000, 437 (2000). tcd TDIMD5 0163-1918
7. T. B. Massalski, Binary Alloy Phase Diagrams (American Society for Metals, Metal Park, OH, 1986).
8. P. Villars and L. D. Calvert, Pearson's Handbook of Crystallographic Data for Intermetallic Phases (American Society for Metals, Metal Park, OH, 1985).
9. R. D. Thompson, K. N. Tu, J. Angillelo, S. Delage, and S. S. Iyer, J. Electrochem. Soc. 135, 3161 (1988). jes JESOAN 0013-4651
10. J.-S. Luo, W.-T. Lin, C. Y. Chang, and W. C. Tsai, J. Appl. Phys. 82, 3621 (1997). jap JAPIAU 0021-8979
11. F. d'Heurle, C. S. Petersson, J. E. E. Baglin, S. J. La Placa, and C. Y. Wong, J. Appl. Phys. 55, 4208 (1984); jap JAPIAU 0021-8979
12. JCPDS diffraction file 38-0844 (NiSi).
13. JCPDS diffraction file 07-0297 (NiGe).
14. Cohesion in Metals: Transition Metal Alloys, edited by F. R. Deboer, R. Boom, W. C. Mattens, A. R. Miedema, and A. K. Niessen (North-Holland, Amsterdam, 1988).
15. C. Detavernier, R. L. Van Meirhaeghe, F. Cardon, and K. Maex, Phys. Rev. B 62, 12045 (2000). prb PRBMDO 0163-1829
16. C. Lavoie, C. Cabral, Jr., F. M. d'Heurle, J. L. Jordan-Sweet, and J. M. E. Harper, J. Electron. Mater. 31, 597 (2002). jem JECMA5 0361-5235
17. D. B. Aldrich, Y. L. Chen, D. E. Sayers, R. J. Nemanich, S. P. Ashburn, and M. C. Öztürk, J. Appl. Phys. 77, 5107 (1995). jap JAPIAU 0021-8979
18. D. B. Aldrich, F. M. d'Heurle, D. E. Sayers, and R. J. Nemanich, Phys. Rev. B 53, 16279 (1996). prb PRBMDO 0163-1829
19. S.-L. Zhang, J. Cardenas, F. M. d'Heurle, B. G. Svensson, and C. S. Petersson, Appl. Phys. Lett. 66, 58 (1995). apl APPLAB 0003-6951
20. T. G. Finstad, D. D. Anfiteatro, V. R. Deline, F. M. d'Heurle, P. Gas, V. L. Moruzzi, K. Schwartz, and J. Tersoff, Thin Solid Films 135, 229 (1986). tsf THSFAP 0040-6090
21. S. Nygren and F. M. d'Heurle, Solid State Phenom. 23&24, 81 (1992). ssq DDBPE8 1012-0394