Properties of Si3N4-layers deposited by medium frequency twin magnetron sputtering

Materials Science Forum

Volumn 287-288, Issue , 1998, Pages 247-250

  Ruske, M ^a   Brauer G ^a   Pistner, J ^a   Szczyrbowski, J ^a   Zmelty, A ^a  

^a EVONIK INDUSTRIES AG   (Germany)

Author keywords

Optical Coatings; Reactive Sputtering; Silicon Nitride; Sputtering; Thin Films

Indexed keywords

EID: 4243224604     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Article

References (9)

1. C. Schaefer, G. Bräuer, J. Szczyrbowski, Surf. Coat. Technol. 93 (1997), p.37
2. J. Szczyrbowski, G. Bräuer, G. Teschner, A. Zmelty, J. Non-Crystalline Solids 218 (1997), p.25
3. th Ann. Techn. Conf. (1995), p. 389
4. G. Bräuer, J. Szczyrbowski, G. Teschner, Surf. Coat. Technol. 94-95 (1997), p. 658
5. A. C. Adams, in Plasma Deposited Thin Films, CRC Press Inc., Boca Raton, Florida, 1986, p.129
6. J. Szczyrbowski, G. Bräuer, M. Ruske, G. Teschner, A. Zmelty, J. Non-Crystalline Solids 218 (1997), p. 262
7. th Ann. Techn. Conf. (1997)
8. S. Jäger, B. Szyszka, J. Szczyrbowski, G. Bräuer, Proc. 5th Int. Conf. on Plasma Surface Engineering, 1997
9. J. A. Thornton, J. Vac. Sci. Technol. A 4 (6), 1986, p. 3059