Two-dimensional ion flux distributions in inductively coupled plasmas: Effect of adding electronegative gases to Ar

Journal of Applied Physics

Volumn 92, Issue 11, 2002, Pages 6444-6450

  Kim, Tae Won ^a   Aydil, Eray S ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CURRENT DENSITY; ELECTRIC DISCHARGES; INFRARED SPECTROSCOPY; IONIZATION; PLASMA ETCHING; SILICON WAFERS;

ELECTRONEGATIVE GASES;

INDUCTIVELY COUPLED PLASMA;

EID: 0036903989     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1517733     Document Type: Article

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