Inductively coupled plasma for polymer etching of 200 mm wafers

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 2, 1996, Pages 732-737

  Forgotson, N ^a   Khemka, V ^a   Hopwood, J ^a  

^a Northeastern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000800742     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588706     Document Type: Article

References (20)

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