-
2
-
-
0012117927
-
Sensitive skin
-
Singapore: World Scientific
-
V. Lumelsky, M.S. Shur, and S. Wagner, "Sensitive skin," in Selected Topics in Electronics and Systems, Singapore: World Scientific, 2000, vol. 18.
-
(2000)
Selected Topics in Electronics and Systems
, vol.18
-
-
Lumelsky, V.1
Shur, M.S.2
Wagner, S.3
-
3
-
-
0005334078
-
Circuit design for a-Si AMLCDs with integrated drivers
-
R.G. Stewart, J. Dresner, S. Weisbrod, R.I. Huq, D. Plus, B. Mourey, B. Hepp, and A. Dupont, "Circuit design for a-Si AMLCDs with integrated drivers," Soc. Inf. Display, Int. Symp. Dig., vol. 26, pp. 89-92, 1995.
-
(1995)
Soc. Inf. Display, Int. Symp. Dig.
, vol.26
, pp. 89-92
-
-
Stewart, R.G.1
Dresner, J.2
Weisbrod, S.3
Huq, R.I.4
Plus, D.5
Mourey, B.6
Hepp, B.7
Dupont, A.8
-
4
-
-
0030101024
-
Crystalline Si films for integrated active-matrix liquid-crystal displays
-
Mar.
-
J.S. Im and R.S. Sposili, "Crystalline Si films for integrated active-matrix liquid-crystal displays," Mat. Res. Soc. Bull., pp. 39-48, Mar. 1996.
-
(1996)
Mat. Res. Soc. Bull.
, pp. 39-48
-
-
Im, J.S.1
Sposili, R.S.2
-
5
-
-
0032651727
-
Hybrid amorphous and polycrystalline silicon devices for large-area electronics
-
P. Mei, J.B. Boyce, D.K. Fork, G. Anderson, J. Ho, J. Lu, M. Hack, and R. Lujan, "Hybrid amorphous and polycrystalline silicon devices for large-area electronics," in Proc. Mat. Res. Soc. Symp., vol. 507, 1999, pp. 3-12.
-
(1999)
Proc. Mat. Res. Soc. Symp.
, vol.507
, pp. 3-12
-
-
Mei, P.1
Boyce, J.B.2
Fork, D.K.3
Anderson, G.4
Ho, J.5
Lu, J.6
Hack, M.7
Lujan, R.8
-
6
-
-
0001607505
-
Inverter made of complementary p and n channel transistors using a single directly deposited microcrystalline silicon film
-
Y. Chen and S. Wagner, "Inverter made of complementary p and n channel transistors using a single directly deposited microcrystalline silicon film," Appl. Phys. Lett., vol. 75, pp. 1125-1127, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 1125-1127
-
-
Chen, Y.1
Wagner, S.2
-
7
-
-
0029471020
-
Trends in polycrystalline-silicon thin-film transistor technologies for AMLCDs
-
Bethlehem, PA
-
T.J. King, "Trends in polycrystalline-silicon thin-film transistor technologies for AMLCDs," in Proc. 2nd Int. Workshop AMLCDs, Bethlehem, PA, 1995, pp. 80-86.
-
(1995)
Proc. 2nd Int. Workshop AMLCDs
, pp. 80-86
-
-
King, T.J.1
-
8
-
-
33747286911
-
Large grain polycrystalline silicon by low-temperature annealing of low-pressure chemical vapor deposited amorphous silicon films
-
M.K. Hatalis and D.W. Greve, "Large grain polycrystalline silicon by low-temperature annealing of low-pressure chemical vapor deposited amorphous silicon films," J. Appl. Phys., vol. 63, pp. 2260-2266, 1988.
-
(1988)
J. Appl. Phys.
, vol.63
, pp. 2260-2266
-
-
Hatalis, M.K.1
Greve, D.W.2
-
9
-
-
36549103626
-
Crystallized Si films by low-temperature rapid thermal annealing of amorphous silicon
-
R. Kakkad, J. Smith, W.S. Lau, and S.J. Fonash, "Crystallized Si films by low-temperature rapid thermal annealing of amorphous silicon," J. Appl. Phys., vol. 65, pp. 2069-2072, 1989.
-
(1989)
J. Appl. Phys.
, vol.65
, pp. 2069-2072
-
-
Kakkad, R.1
Smith, J.2
Lau, W.S.3
Fonash, S.J.4
-
10
-
-
0022719826
-
XeCl excimer laser annealing used in the fabrication of poly-Si TFTs
-
T. Sameshima, S. Usui, and M. Sekiya, "XeCl excimer laser annealing used in the fabrication of poly-Si TFTs," IEEE Electron Device Lett., vol. EDL-7, pp. 276-278, 1986.
-
(1986)
IEEE Electron Device Lett.
, vol.EDL-7
, pp. 276-278
-
-
Sameshima, T.1
Usui, S.2
Sekiya, M.3
-
11
-
-
0029546405
-
Properties of glass substrates for poly-Si AMLCD technology
-
D.M. Moffat, "Properties of glass substrates for poly-Si AMLCD technology," in Proc. Mat. Res. Soc. Symp., vol. 377, 1995, pp. 871-876.
-
(1995)
Proc. Mat. Res. Soc. Symp.
, vol.377
, pp. 871-876
-
-
Moffat, D.M.1
-
12
-
-
0034986297
-
Glass: A critical material in the development of electronic displays
-
F.P. Fehlner, "Glass: A critical material in the development of electronic displays," J. Soc. Inf. Display, vol. 9, pp. 19-22, 2001.
-
(2001)
J. Soc. Inf. Display
, vol.9
, pp. 19-22
-
-
Fehlner, F.P.1
-
13
-
-
21344491521
-
Oxygen-plasma-enhanced crystallization of a-Si:H films on glass
-
A. Yin and S.J. Fonash, "Oxygen-plasma-enhanced crystallization of a-Si:H films on glass," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 12, pp. 1237-1240, 1994.
-
(1994)
J. Vac. Sci. Technol. A, Vac. Surf. Films
, vol.12
, pp. 1237-1240
-
-
Yin, A.1
Fonash, S.J.2
-
14
-
-
0001520955
-
Kinetics of silicide-induced crystallization of polycrystalline thin-film transistors fabricated from amorphous chemical-vapor deposition silicon
-
H. Kim, J.G. Couillard, and D.G. Ast, "Kinetics of silicide-induced crystallization of polycrystalline thin-film transistors fabricated from amorphous chemical-vapor deposition silicon," Appl. Phys. Lett., vol. 72, pp. 803-805, 1998.
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 803-805
-
-
Kim, H.1
Couillard, J.G.2
Ast, D.G.3
-
15
-
-
0000592141
-
Hydrogen plasma enhanced crystallization of hydrogenated amorphous silicon films
-
K. Pangal, J.C. Sturm, and S. Wagner, "Hydrogen plasma enhanced crystallization of hydrogenated amorphous silicon films," J. Appl. Phys., vol. 85, pp. 1900-1906, 1999.
-
(1999)
J. Appl. Phys.
, vol.85
, pp. 1900-1906
-
-
Pangal, K.1
Sturm, J.C.2
Wagner, S.3
-
16
-
-
0030403279
-
Amorphous silicon thin-film transistors on steel foil substrates
-
Dec.
-
S.D. Theiss and S. Wagner, "Amorphous silicon thin-film transistors on steel foil substrates," IEEE Electron Device Lett., vol. 17, pp. 578-580, Dec. 1996.
-
(1996)
IEEE Electron Device Lett.
, vol.17
, pp. 578-580
-
-
Theiss, S.D.1
Wagner, S.2
-
17
-
-
0017997946
-
Crystallization of amorphous silicon films
-
U. Köster, "Crystallization of amorphous silicon films," Phys. Stat. Sol. (a), vol. 48, pp. 313-321, 1978.
-
(1978)
Phys. Stat. Sol. (a)
, vol.48
, pp. 313-321
-
-
Köster, U.1
-
18
-
-
36549098234
-
2: Temperature dependence of the crystallization parameters
-
2: Temperature dependence of the crystallization parameters," J. Appl. Phys, vol. 62, pp. 1675-1681, 1987.
-
(1987)
J. Appl. Phys
, vol.62
, pp. 1675-1681
-
-
Iverson, R.B.1
Reif, R.2
-
20
-
-
0000853145
-
Mechanics of rollable and foldable film-on-foil electronics
-
Z. Suo, E.Y. Ma, H. Gleskova, and S. Wagner, "Mechanics of rollable and foldable film-on-foil electronics," Appl. Phys. Lett., vol. 74, pp. 1177-1179, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 1177-1179
-
-
Suo, Z.1
Ma, E.Y.2
Gleskova, H.3
Wagner, S.4
-
21
-
-
0000180678
-
Failure resistance of amorphous silicon transistors under extreme in-plane strain
-
H. Gleskova, S. Wagner, and Z. Suo, "Failure resistance of amorphous silicon transistors under extreme in-plane strain," Appl. Phys. Lett., vol. 75, pp. 3011-3013, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 3011-3013
-
-
Gleskova, H.1
Wagner, S.2
Suo, Z.3
-
22
-
-
0031383301
-
Integration of organic LEDs and amorphous Si TFTs onto flexible and lightweight metal foil substrates
-
Dec.
-
C.C. Wu, S.D. Theiss, G. Gu, M.H. Lu, J.C. Sturm, S. Wagner, and S.R. Forrest, "Integration of organic LEDs and amorphous Si TFTs onto flexible and lightweight metal foil substrates," IEEE Electron Device Lett., vol. 18, pp. 609-612, Dec. 1997.
-
(1997)
IEEE Electron Device Lett.
, vol.18
, pp. 609-612
-
-
Wu, C.C.1
Theiss, S.D.2
Gu, G.3
Lu, M.H.4
Sturm, J.C.5
Wagner, S.6
Forrest, S.R.7
-
23
-
-
0012123895
-
-
Online
-
[Online]. Available: http://www.ovonic.com/unitedsolar/engentek.html.
-
-
-
-
24
-
-
0001601707
-
High electron mobility polycrystalline silicon thin-film transistors on steel foil substrates
-
M. Wu, K. Pangal, J.C. Sturm, and S. Wagner, "High electron mobility polycrystalline silicon thin-film transistors on steel foil substrates," Appl. Phys. Lett., vol. 75, pp. 2244-2246, 1999.
-
(1999)
Appl. Phys. Lett.
, vol.75
, pp. 2244-2246
-
-
Wu, M.1
Pangal, K.2
Sturm, J.C.3
Wagner, S.4
-
25
-
-
0034140186
-
Poly-Si thin-film transistors on steel substrates
-
R.S. Howell, M. Stewart, S.V. Karnik, S.K. Saha, and M.K. Hatalis, "Poly-Si thin-film transistors on steel substrates," IEEE Electron Device Lett., vol. 21, pp. 70-72, 2000.
-
(2000)
IEEE Electron Device Lett.
, vol.21
, pp. 70-72
-
-
Howell, R.S.1
Stewart, M.2
Karnik, S.V.3
Saha, S.K.4
Hatalis, M.K.5
-
26
-
-
0036564698
-
High-quality polycrystalline Si TFTs fabricated on stainless-steel foils by using sputtered Si films
-
T. Serikawa and F. Omata, "High-quality polycrystalline Si TFTs fabricated on stainless-steel foils by using sputtered Si films," IEEE Trans. Electron Devices, vol. 49, pp. 820-825, 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, pp. 820-825
-
-
Serikawa, T.1
Omata, F.2
-
27
-
-
0028740817
-
Improvement of grain size by crystallization of double-layer amorphous silicon films
-
D.G. Moon, J.N. Lee, H.B. Im, B.T. Ahn, K.S. Nam, and S.W. Kang, "Improvement of grain size by crystallization of double-layer amorphous silicon films," in Proc. Mat. Res. Soc. Symp., vol. 345, 1994, pp. 111-116.
-
(1994)
Proc. Mat. Res. Soc. Symp.
, vol.345
, pp. 111-116
-
-
Moon, D.G.1
Lee, J.N.2
Im, H.B.3
Ahn, B.T.4
Nam, K.S.5
Kang, S.W.6
-
28
-
-
0028731003
-
Rapid thermal crystallization of LPCVD amorphous silicon films
-
A.T. Voutsas, M.K. Hatalis, K.R. Olasupo, A.K. Nanda, and D. Alugbin, "Rapid thermal crystallization of LPCVD amorphous silicon films," in Proc. Mat. Res. Soc. Symp., vol. 345, 1994, pp. 95-98.
-
(1994)
Proc. Mat. Res. Soc. Symp.
, vol.345
, pp. 95-98
-
-
Voutsas, A.T.1
Hatalis, M.K.2
Olasupo, K.R.3
Nanda, A.K.4
Alugbin, D.5
-
29
-
-
0028381651
-
Optoelectronic and structural properties of polysilicon produced by excimer laser and furnace crystallization of hydrogenated amorphous silicon (a-Si: H)
-
T.E. Dryer, J.M. Marshall, W. Pickin, A.R. Hepburn, and J.F. Davies, "Optoelectronic and structural properties of polysilicon produced by excimer laser and furnace crystallization of hydrogenated amorphous silicon (a-Si: H)," Proc. Inst., Electr., Eng.,-Circuits Devices Syst., vol. 141, pp. 15-18, 1994.
-
(1994)
Proc. Inst., Electr., Eng.,-Circuits Devices Syst.
, vol.141
, pp. 15-18
-
-
Dryer, T.E.1
Marshall, J.M.2
Pickin, W.3
Hepburn, A.R.4
Davies, J.F.5
-
30
-
-
0034251092
-
Thin-film transistors in potycrystalline silicon by blanket and local source/drain hydrogen plasma-seeded crystallization
-
No. Aug.
-
K. Pangal, Y. Chen, J.C. Sturm, S. Wagner, and N. Yao, "Thin-film transistors in potycrystalline silicon by blanket and local source/drain hydrogen plasma-seeded crystallization," IEEE Trans. Electron Devices, vol. 47, no. Aug., pp. 1599-1607, 2000.
-
(2000)
IEEE Trans. Electron Devices
, vol.47
, pp. 1599-1607
-
-
Pangal, K.1
Chen, Y.2
Sturm, J.C.3
Wagner, S.4
Yao, N.5
|