Recent developments in rapid thermal processing

Journal of Electronic Materials

Volumn 31, Issue 10 SPEC., 2002, Pages 981-987

  Fiory, A T ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Emissivity; Ion implantation; Spike annealing; Temperature control; Ultra shallow junctions

Indexed keywords

DOPING (ADDITIVES); ION IMPLANTATION; PYROMETRY; SEMICONDUCTOR JUNCTIONS; SILICON WAFERS; THERMAL DIFFUSION;

TRANSIENT-ENHANCED DIFFUSION (TED);

RAPID THERMAL ANNEALING;

EID: 0036809676     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-002-0031-9     Document Type: Conference Paper

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