Spike annealing of boron-implanted polycrystalline-silicon on thin SiO2

Applied Physics Letters

Volumn 78, Issue 8, 2001, Pages 1071-1073

  Fiory, A T ^a   Bourdelle, K K ^b   Roy, P K ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000690221     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1348307     Document Type: Article

References (14)

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