Peak and integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2998-3002

  Stuik, R ^a   Louis, E ^a   Yakshin, A E ^a   Gorts P C ^a   Maas, E L G ^a   Bijkerk, F ^a   Schmitz, D ^b   Scholze, F ^b   Ulm, G ^b   Haidl, M ^c  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^c CARL ZEISS SMT AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040708640     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590942     Document Type: Article

References (11)

1. E. Spiller, Soft X-ray Optics (SPIE, Bellingham, WA, 1994).
2. E. Spiller, Appl. Phys. Lett. 54, 2293 (1989).
3. H.-J. Voorma, E. Louis, S. Abdali, and F. Bijkerk, J. Appl. Phys. 82, 1876 (1997).
4. D. Fuchs, M. Krumrey, P. Müller, F. Scholze, and G. Ulm, Rev. Sci. Instrum. 66, 2248 (1995).
5. H.-J. Voorma, E. Louis, N. B. Koster, F. Bijkerk, and E. Spiller, J. Appl. Phys. 81, 6112 (1997).
6. http://www-cxro.lbl.gov/optical_constants/ (November 1998).
7. R. Soufli and E. Gullikson, Appl. Opt. 37, 1713 (1998).
8. D. K. G. de Boer, Phys. Rev. B 49, 5817 (1994).
9. C. Montcalm, S. Bajt, P. B. Mirkarimi, E. Spiller, F. J. Weber, and J. A. Folta, Proc. SPIE 3331, 42 (1998).
10. G. D. Kubiak, L. J. Bernardez, K. D. Krenz, and W. C. Sweatt, Proc. SPIE 3676, 669 (1999).
11. J. P. Benschop, W. M. Kaiser, and D. C. Ockwell, Proc. SPIE 3676, 246. (1999).