A study of charge trapping in pecvd pteos films

IEEE Transactions on Nuclear Science

Volumn 44, Issue 6 PART 1, 1997, Pages 1834-1839

  Lenahan, Patrick M ^b   Billman, Curtis A ^a   Fuller, Robert ^b   Evans, Howard ^a   Speece, William H ^b   Decrosta, David ^a   Lowry, Robert ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b INTERSIL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; COLOR CENTERS; PARAMAGNETIC RESONANCE; PHOSPHORUS; PLASMA APPLICATIONS; SEMICONDUCTING FILMS; SEMICONDUCTING GLASS; SILICATES; VOLTAGE MEASUREMENT;

CHARGE TRAPPING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); TETRAETHYLORTHOSILICATES (TEOS);

SILICON WAFERS;

EID: 0031354376     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/23.658950     Document Type: Article

References (9)

1. D.L. Griscom, E.J. Friebele, K.J. Long, and J.W. Fleming, Fundamental defect centers in glass: Electron spin resonance and optical absorption studies of irradiated phosphorous-doped silica glass and optical fibers, J. Appl. Phys., Vol. 43, pp. 960-967 1976.
2. D.L. Griscom, G.H. Sigel Jr., and R.J. Ginther, Defect centers hi a pure-silica core borosilicate-clad optical fiber: ESR studies, J. Appl. Phys., Vol. 54, pp. 3743-3762 1983.
3. 2 thin films, Appl. Phys. Lett., Vol. 67, pp. 995-997 1995.
4. W.L. Warren, M.R. Shaneyfelt, D.M. Fleetwood, P.S. Winokur, and S. Montague, Electron and Hole Trapping in Doped Oxides, IEEE Trans. Nucl. Sei., Vol. 42, pp. 17311739 (1995).
5. R. Fuller, H. Evans, C. Gamlin, B. Czagas, M. Morrison, D. Decrosta, R. Lowry, P. Lenahan and C. Frye, The Effect of Deposition Conditions on the Radiation Tolerance of BPSG Films, IEEE Trans. Nucl. Sei., Vol. 43, pp. 2565-2571 1996.
6. D.A. DeCrosta, J.J. Hackenberg, and J.H. Linn, Characterization of High Oxygen: Tetraethylorthosilicate Ratio Plasma-Enhanced Chemical Vapor Deposited Films, J. Electrochem Soc., Vol. 143 No. 3, pp. 1079 March 1996.
7. D.A. DeCrosta, and J.J. Hackenberg, Charge issues in high oxygen gas ratio tetraethylorthosilicate plasma enhanced chemical vapor deposition films, J. Vac. Sei. Technol. Soc., Vol. 14 No. 3, pp. 709 May-June 1996.
8. 2 Interface III. H.Z. Massoud, E.H. Poindexter, and C.R. Helms, The Electrochemical Society, Pennington, NJ (1996) pp. 214-249.
9. W. Gordy, Theory and Applications of Electron Spin Resonance. New York, John Wiley and Sons, 1980 pp. 354-441.