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Volumn 42, Issue 4-5, 2002, Pages 555-564

Analysis and modeling of a digital CMOS circuit operation and reliability after gate oxide breakdown: A case study

Author keywords

[No Author keywords available]

Indexed keywords

DIGITAL CIRCUITS; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRON MICROSCOPY; FAILURE ANALYSIS; FIELD EFFECT TRANSISTORS; GATES (TRANSISTOR); RELIABILITY; SOLID STATE OSCILLATORS; STATISTICAL METHODS;

EID: 0036540085     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(02)00026-4     Document Type: Article
Times cited : (42)

References (37)
  • 1
    • 67649507364 scopus 로고    scopus 로고
    • Physical and predictive models of ultra thin oxide reliability in CMOS devices and circuits
    • (2001) IRPS Proc , pp. 132-149
    • Stathis, J.H.1
  • 7
    • 0033343947 scopus 로고    scopus 로고
    • Oxides in 50 nm devices: Thickness uniformity improves projected reliability
    • (1999) IEDM Tech Dig , pp. 437-440
    • Weir, B.1
  • 10
  • 12
    • 0034453380 scopus 로고    scopus 로고
    • Impact of MOSFET oxide breakdown on digital circuit operation and reliability
    • (2000) IEDM Tech Dig , pp. 553-556
    • Kaczer, B.1
  • 36
    • 0035714563 scopus 로고    scopus 로고
    • Statistical model for stress-induced leakage current and pre-breakdown current jumps in ultra-thin oxide layers
    • (2001) IEDM Tech Dig , pp. 121-124
    • Degraeve, R.1
  • 37
    • 0035716695 scopus 로고    scopus 로고
    • Analytical model for failure rate prediction due to anomalous charge loss of flash memories
    • (2001) IEDM Tech Dig , vol.4 , pp. 699-702
    • Degraeve, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.