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Journal of the Electrochemical Society

Volumn 149, Issue 2, 2002, Pages

Surface kinetics model for SiLK chemical mechanical polishing

(4) Borst, Christopher L a Thakurta, Dipto G a Gill, William N a Gutmann, Ronald J b

a Rensselaer Polytechnic Institute (United States)

b RENSSELAER POLYTECHNIC INSTITUTE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; CHEMICAL MECHANICAL POLISHING; DIFFUSION; MASS TRANSFER; REACTION KINETICS; SILICON COMPOUNDS; SLURRIES;

MASS TRANSPORT EQUATIONS;

SURFACE REACTIONS;

EID: 0036476103 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1431576 Document Type: Article

Times cited : (32)

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