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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2187-2197

Experiments on the plasma assisted chemical vapor deposition of copper

(2) Lakshmanan, Satish K a Gill, William N a

a RENSSELAER POLYTECHNIC INSTITUTE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032353595 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.581327 Document Type: Article

Times cited : (20)

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