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Volumn 12, Issue 2, 2002, Pages 128-135

A high-aspect-ratio comb actuator using UV-LIGA surface micromachining and (110) silicon bulk micromachining

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ASPECT RATIO; CALCULATIONS; ETCHING; MICROMACHINING; NATURAL FREQUENCIES; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SURFACES;

EID: 0036466267     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/12/2/306     Document Type: Article
Times cited : (30)

References (28)
  • 2
    • 0032141048 scopus 로고    scopus 로고
    • High-aspect-ratio micromachining via deep x-ray lithography
    • (1998) Proc. IEEE , vol.86 , pp. 1586-1593
    • Guckel, H.1
  • 24
    • 0006409729 scopus 로고    scopus 로고
    • Novel fabrication of comb actuator using reactive ion etching of polysilicon and (110) Si anisotropic bulk etching in KOH Japan
    • (1998) J. Appl. Phys. , vol.37 , pp. 7086-7092
    • Lim, H.T.1    Kim, Y.K.2
  • 26
    • 0006449406 scopus 로고    scopus 로고
    • Novel fabrication process of freestanding metallic microstructures using double electroplating Japan
    • (1998) J. Appl. Phys. , vol.37 , pp. 7104-7109
    • Baek, C.-W.1    Kim, Y.-K.2
  • 27
    • 0003737572 scopus 로고    scopus 로고
    • A study on the mechanical property measurement and application of the electroplated microstructure
    • PhD Thesis Seoul National University
    • (2000) , pp. 120-147
    • Baek, C.-W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.