Characterization of anisotropic etching properties of single-crystal silicon: Effects of KOH concentration on etching profiles

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1997, Pages 406-411

  Sato, Kazuo ^a   Shikida, Mitsuhiro ^a   Matsushima, Yoshihiro ^a   Yamashiro, Takashi ^a   Asaumi, Kazuo ^a   Iriye, Yasuroh ^a   Yamamoto, Masaharu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; DATABASE SYSTEMS; ETCHING; POTASSIUM COMPOUNDS; SEMICONDUCTING SILICON; THERMAL EFFECTS;

POTASSIUM HYDROXIDE;

SINGLE CRYSTALS;

EID: 0030677613     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)