Anisotropic Bulk Etching of (110) Silicon with High Aspect Ratio

IEEJ Transactions on Sensors and Micromachines

Volumn 118, Issue 1, 1998, Pages 32-36

  Kim, Seong Hyok ^a   Lee, Sang Hun ^a   Lim, Hyung Taek ^a   Kim, Yong Kweon ^a   Lee, Seung Ki ^b  

^a Seoul National University   (South Korea)

^b Dankook University   (South Korea)

Author keywords

(110) silicon; anisotropic bulk etching; comb structure; high aspect ratio

Indexed keywords

EID: 85010111987     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.118.32     Document Type: Article

References (11)

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