High-aspect-ratio micromachining via deep X-ray lithography

Proceedings of the IEEE

Volumn 86, Issue 8, 1998, Pages 1586-1593

  Guckel, H ^a  

^a University of Wisconsin Madison ^*  (United States)

Author keywords

LIGA; Microelectrornechanical devices; Micromachining; Precision engineering; X ray lithography

Indexed keywords

ACTUATORS; ASPECT RATIO; ELECTROPLATING; MICROELECTROMECHANICAL DEVICES; PHOTONS; PHOTORESISTS; POLYIMIDES; PRECISION ENGINEERING; TECHNOLOGY; X RAY LITHOGRAPHY;

HIGH ASPECT RATIO MICROSYSTEMS TECHNOLOGY; REPLANARIZATION; X RAY MASK;

MICROMACHINING;

EID: 0032141048     PISSN: 00189219     EISSN: None     Source Type: Journal    
DOI: 10.1109/5.704264     Document Type: Article

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