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Volumn 16, Issue 6, 1998, Pages 3435-3439

High-accuracy interferometry of extreme ultraviolet lithographic optical systems

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0005677105     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590498     Document Type: Article
Times cited : (7)

References (13)
  • 7
    • 0002039216 scopus 로고
    • edited by A. M. Hawryluk and R. H. Stulen Optical Society of America, Washington, DC
    • D. Tichenor et al., in OSA Proceedings on Soft X-Ray Projection Lithography, edited by A. M. Hawryluk and R. H. Stulen (Optical Society of America, Washington, DC, 1993), Vol. 18, pp. 79-82.
    • (1993) OSA Proceedings on Soft X-Ray Projection Lithography , vol.18 , pp. 79-82
    • Tichenor, D.1
  • 12
    • 11744298606 scopus 로고    scopus 로고
    • Ph.D. dissertation, University of California, Berkeley
    • K. A. Goldberg, Ph.D. dissertation, University of California, Berkeley, 1997.
    • (1997)
    • Goldberg, K.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.